An ultrahigh vacuum system for the scattering of keV ions by a clean silicon(100) surface.

An ultrahigh vacuum system for the scattering of keV ions by a clean silicon(100) surface.

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dc.contributor.advisor Hird, B., en
dc.contributor.author Bruyère, Michel Jean. en
dc.date.accessioned 2009-03-20T20:27:21Z
dc.date.available 2009-03-20T20:27:21Z
dc.date.created 1990 en
dc.date.issued 2009-03-20T20:27:21Z
dc.identifier.citation Source: Masters Abstracts International, Volume: 30-03, page: 0774. en
dc.identifier.isbn 9780315600249 en
dc.identifier.uri http://hdl.handle.net/10393/5952
dc.description.abstract An ultrahigh vacuum surface physics system was designed and built to study ion-surface interactions at various incident angles by detection of the forward scattered particles. The proposed initial measurement is the scattering of keV ions by a clean Si(100) surface. en
dc.format.extent 68 p. en
dc.publisher University of Ottawa (Canada). en
dc.subject.classification Physics, Condensed Matter. en
dc.title An ultrahigh vacuum system for the scattering of keV ions by a clean silicon(100) surface. en
dc.type M.Sc.Thesis (M.Sc.)--University of Ottawa (Canada), 1990. en

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